Aggressive scaling of Cu/low k: Impact on metrology

AIP Conference Proceedings

Volumn 788, Issue , 2005, Pages 475-481

  Maex, Karen ^a,b   Brongersma, Sywert H ^d   Iacopi, Francesca ^d   Vanstreels, Kris ^c   Travaly, Youssef ^d   Baklanov, Mikhail ^d   D'Haen, Jan ^c   Beyer, Gerald ^d  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

^c HASSELT UNIVERSITY   (Belgium)

^d Division IMOMEC ^*

Author keywords

Cu; Interface characterization; Lowk; Scaling

Indexed keywords

EID: 33749661211     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2063005     Document Type: Conference Paper

References (23)

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