In-situ IR and spectroscopic ellipsometric analysis of growth process and structural properties of Ti1-xNbxO2 thin films by metal-organic chemical vapor deposition

Thin Solid Films

Volumn 346, Issue 1, 1999, Pages 73-81

  Gao, Y ^a  

^a PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRY; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; METALLIC FILMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SURFACE ROUGHNESS; TITANIUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

PENTAETHOXY NIOBIUM; SPECTROSCOPIC ELLIPSOMETRY; TITANIUM TETRAISOPROPOXIDE;

THIN FILMS;

EID: 0033148538     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01431-X     Document Type: Article

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