Fine-feature patterning of self-aligned polymeric thin-film transistors fabricated by digital lithography and electroplating

Applied Physics Letters

Volumn 89, Issue 14, 2006, Pages

  Wong, W S ^a   Chow, E M ^a   Lujan, R ^a   Geluz Aguilar, V ^a   Chabinyc, M L ^a  

^a PALO ALTO RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIGITAL LITHOGRAPHY; FIELD EFFECT MOBILITY; GATE WIDTHS; POLYTHIOPHENE;

ELECTROPLATING; GATES (TRANSISTOR); LITHOGRAPHY; MASKS; NICKEL PLATING; PLASTIC FILMS; THRESHOLD VOLTAGE;

THIN FILM TRANSISTORS;

EID: 33749495975     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2360237     Document Type: Article

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