Electroless deposition of NiB on 15 inch glass substrates for the fabrication of transistor gates for liquid crystal displays

Langmuir

Volumn 19, Issue 14, 2003, Pages 5923-5935

  Delamarche, Emmanuel ^a   Geissler, Matthias ^a   Vichiconti, James ^b   Graham, William S ^b   Andry, Paul A ^b   Flake, John C ^b,c   Fryer, Peter M ^b   Nunes, Ronald W ^b   Michel, Bruno ^a   O'Sullivan, Eugene J ^d   Schmidt, Heinz ^a   Wolf, Heiko ^a   Wisnieff, Robert L ^b  

^a IBM RESEARCH ZURICH   (Switzerland)

^b Adv Display Technology Laboratory   (United States)

^c MOTOROLA INC   (United States)

^d IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROLESS PLATING; GATES (TRANSISTOR); GLASS; NICKEL COMPOUNDS; PHOTORESISTS; THIN FILM TRANSISTORS;

MICROCONTACT PRINTING;

LIQUID CRYSTAL DISPLAYS;

EID: 0037703303     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la0341714     Document Type: Article

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