Micro-Raman spectroscopic study of two-dimensional stress distribution in poly-Si induced by CoSi2 patterns

Semiconductor Science and Technology

Volumn 13, Issue 6, 1998, Pages 634-636

  Li, B B ^a   Huang, F ^a   Zhang, S L ^a   Gao, Y ^a   Zhang, L ^a  

^a PEKING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0004993642     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/13/6/016     Document Type: Article

References (8)

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