메뉴 건너뛰기
Optics Express
Volumn 14, Issue 19, 2006, Pages 8482-8491
Scatterometry-based metrology with feature region signatures matching
Author keywords

[No Author keywords available]
Indexed keywords

DIFFRACTION GRATINGS; LITHOGRAPHY; MEASUREMENTS; PATTERN MATCHING;
EID: 33748926098     PISSN: 10944087     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.14.008482     Document Type: Article
Times cited : (30)
References (8)
  • 1
    • 24644494674 scopus 로고    scopus 로고
    • Comparisons of overlay measurement using conventional bright-field microscope and angular scatterometer
    • Metrology, Inspection, and Process Control for Microlithography XIX, R. M. Silver., ed.
    • C. H. Ko, Y. S. Ku, N. P. Smith, D. M. Shyu, S. C. Wang and S. H. Lu, "Comparisons of overlay measurement using conventional bright-field microscope and angular scatterometer," in Metrology, Inspection, and Process Control for Microlithography XIX, R. M. Silver., ed., Proc. SPIE 5752, 987-966 (2005).
    • (2005) Proc. SPIE , vol.5752 , pp. 987-1966
    • Ko, C.H.1    Ku, Y.S.2    Smith, N.P.3    Shyu, D.M.4    Wang, S.C.5    Lu, S.H.6
  • 2
    • 4344703198 scopus 로고    scopus 로고
    • 90 nm lithography process characterization using ODP scatterometry technology
    • Metrology, Inspection, and Process Control for Microlithography XVIII, R. M. Silver; ed.
    • C. M Ke, S. S. Yu, Y. H. Wang, Y. J. Chou, J. H. Chen, B. H. Lee, H. Y. Chu, H. T. Lin, T. S. Gau, C. H. Lin, Y. C. Ku and B. J. Lin, "90 nm Lithography Process Characterization using ODP Scatterometry Technology," in Metrology, Inspection, and Process Control for Microlithography XVIII, R. M. Silver; ed., Proc. SPIE 5375, 597-604 (2004).
    • (2004) Proc. SPIE , vol.5375 , pp. 597-604
    • Ke, C.M.1    Yu, S.S.2    Wang, Y.H.3    Chou, Y.J.4    Chen, J.H.5    Lee, B.H.6    Chu, H.Y.7    Lin, H.T.8    Gau, T.S.9    Lin, C.H.10    Ku, Y.C.11    Lin, B.J.12
  • 3
    • 0036030722 scopus 로고    scopus 로고
    • Novel implementations of scatterometry for lithography process control
    • Metrology, Inspection, and Process Control for Microlithography XVI, D. J. Herr, ed.
    • M. Littau, C. J. Raymond, C Gould, and C. Gambill, "Novel implementations of scatterometry for lithography process control," in Metrology, Inspection, and Process Control for Microlithography XVI, D. J. Herr, ed., Proc. SPIE 4689, 506-516 (2002).
    • (2002) Proc. SPIE , vol.4689 , pp. 506-516
    • Littau, M.1    Raymond, C.J.2    Gould, C.3    Gambill, C.4
  • 4
    • 4344631289 scopus 로고    scopus 로고
    • Successful application of angular scatterometry to process control in sub-100-nm DRAM device
    • Metrology, Inspection, and Process Control for Microlithography XVIII, R. M. Silver; ed.
    • J. A. Kim, S. J. Kim, S. B. Chin, S. H. Oh, D. Goo, S. J. Lee, S. G. Woo, H. K. Cho, W. S. Han, J. T. Moon, C. J. Raymond, M. E. Littau, B. Youn, and C. J. Sohn, "Successful application of angular scatterometry to process control in sub-100-nm DRAM device," in Metrology, Inspection, and Process Control for Microlithography XVIII, R. M. Silver; ed., Proc. SPIE. 5375, 541-549 (2004).
    • (2004) Proc. SPIE , vol.5375 , pp. 541-549
    • Kim, J.A.1    Kim, S.J.2    Chin, S.B.3    Oh, S.H.4    Goo, D.5    Lee, S.J.6    Woo, S.G.7    Cho, H.K.8    Han, W.S.9    Moon, J.T.10    Raymond, C.J.11    Littau, M.E.12    Youn, B.13    Sohn, C.J.14
  • 5
    • 0141500274 scopus 로고    scopus 로고
    • A novel diffraction based spectroscopic method for overlay metrology
    • Metrology, Inspection, and Process Control for Microlithography XVII, D. J. Herr, ed.
    • W. Yang, R. L. Webb, S. Rabello, J. Hu, J. Y. Lin, J. Heaton, M. Dusa, A. de Boef, M. van der Schaar, and A. Hunter, "A novel diffraction based spectroscopic method for overlay metrology," in Metrology, Inspection, and Process Control for Microlithography XVII, D. J. Herr, ed., Proc. SPIE. 5038 200-207 (2003).
    • (2003) Proc. SPIE , vol.5038 , pp. 200-207
    • Yang, W.1    Webb, R.L.2    Rabello, S.3    Hu, J.4    Lin, J.Y.5    Heaton, J.6    Dusa, M.7    De Boef, A.8    Van Der Schaar, M.9    Hunter, A.10
  • 6
    • 0141723696 scopus 로고    scopus 로고
    • Scatterometry-based overlay metrology
    • Metrology, Inspection, and Process Control for Microlithography XVII, D. J. Herr, ed.
    • H. T. Huang, G. Raghavendra, A. Sezginer, K. Johnson, F. Stanke, M. Zimmerman, C. Cheng, M. Miyagi, and B. Singh, "Scatterometry-Based Overlay Metrology," in Metrology, Inspection, and Process Control for Microlithography XVII, D. J. Herr, ed., Proc. SPIE 5038 126-137 (2003).
    • (2003) Proc. SPIE , vol.5038 , pp. 126-137
    • Huang, H.T.1    Raghavendra, G.2    Sezginer, A.3    Johnson, K.4    Stanke, F.5    Zimmerman, M.6    Cheng, C.7    Miyagi, M.8    Singh, B.9
  • 7
    • 0036029338 scopus 로고    scopus 로고
    • Fundamental solution for real-time optical CD metrology
    • Metrology, Inspection, and Process Control for Microlithography XVI, D. J. Herr, ed.
    • J. Opsal, H. Chu, Y. Wen, Y. C. Chang and G. Li, "Fundamental solution for real-time optical CD metrology," in Metrology, Inspection, and Process Control for Microlithography XVI, D. J. Herr, ed., Proc. SPIE 4689, 163-176 (2002).
    • (2002) Proc. SPIE , vol.4689 , pp. 163-176
    • Opsal, J.1    Chu, H.2    Wen, Y.3    Chang, Y.C.4    Li, G.5
  • 8
    • 0036123710 scopus 로고    scopus 로고
    • Linearized inversion of scatterometric data to obtain surface profile information
    • E. M. Drege, J. A. Read and D. M. Byrne, "Linearized inversion of scatterometric data to obtain surface profile information," Opt. Eng. 41, 225-236 (2002).
    • (2002) Opt. Eng. , vol.41 , pp. 225-236
    • Drege, E.M.1    Read, J.A.2    Byrne, D.M.3

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.