Deposition and DC electrical characterisation of rf magnetron sputtered silicon nitride thin films

Thin Solid Films

Volumn 515, Issue 2 SPEC. ISS., 2006, Pages 509-512

  Gould, R D ^a   Awan, S A ^a  

^a Electronic Engineering Group   (United Kingdom)

Author keywords

Electrical properties and measurements; Silicon nitride; Sputtering

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC PROPERTIES; ELECTRIC VARIABLES MEASUREMENT; ELECTRODES; GOLD; MAGNETRON SPUTTERING; SILICON NITRIDE; TEMPERATURE MEASUREMENT; VLSI CIRCUITS;

AU ELECTRODES; GAS PRESSURES; RF SPUTTERING; SILICON NITRIDE THIN FILMS;

THIN FILMS;

EID: 33748904370     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.12.285     Document Type: Article

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