Erbium-doped ZnO prepared by vapor-phase transport

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 45, Issue 33-36, 2006, Pages

  Chao, Liang Chiun ^a   Chiang, Ping Chang ^a   Yang, Shih Hsuan ^a   Huang, Jian Wei ^a   Liau, Chung Chi ^a   Chen, Jyh Shin ^b   Su, Chien Ying ^b  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^b INSTRUMENT TECHNOLOGY RESEARCH CENTER   (Taiwan)

Author keywords

Erbium; Photoluminescence; Zinc oxide

Indexed keywords

ANNEALING; ERBIUM; GRAPHITE; PHASE TRANSITIONS; PHOTOLUMINESCENCE; POWDER METALS; VAPOR PHASE EPITAXY;

ERBIUM-DOPED ZNO; GRAPHITE POWDER; GREEN EMISSIONS; VAPOR-PHASE TRANSPORT;

ZINC OXIDE;

EID: 33748809031     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.L938     Document Type: Article

References (20)

1. Y. Chen, D. M. Bagnall, Z. Zhu, T. Sekiuchi, K. Park, K. Hiraga, T. Yao, S. Koyama, M. Y. Shen and T, Goto: J. Cryst. Growth 181 (1997) 165.
2. R. Martins, E. Fortunato, P. Nunes, I. Ferreira and A. Marques: J. Appl. Phys. 96 (2004) 1398.
3. C. J. Lee, T. J. Lee, S. C. Lyu and Y. Zhang: Appl. Phys. Lett. 81 (2002) 3648.
4. X. Jiang, F. L. Wong, M. K. Fung and S. T. Lee: Appl. Phys. Lett. 83 (2003) 1875.
5. P. X. Gao and Z. L. Wang: J. Appl. Phys. 97 (2005) 044304.
6. S. Komuro, T. Katsumata, T. Morikawa, X. Zhao, H. Isshiki and Y. Aoyagi: J. Appl. Phys. 88 (2000) 7129.
7. E. Rita, E. Alves, U. Wahl, J. G. Correia, T. Monteiro, M. J. Soares, A. Neves and M. Peres: Nucl. Instrum. Methods Phys. Res., Sect. B 242 (2006) 580.
8. T. Schmidt, G. Müller and L. Spanhel: Chem. Mater. 10 (1998) 65.
9. A. Goux, T. Pauporté and D. Lincot: J. Electroanal. Chem. 587 (2006) 193.
10. X. T. Zhang, Y. C. Liu, J. G. Ma, Y. M. Lu, D. Z. Shen, W. Xu, G. Z. Zhong and X. W. Fan: Thin Solid Films 413 (2002) 257.
11. J. Cheng, R. Guo and Q. M. Wang: Appl. Phys. Lett. 85 (2004) 5140.
12. M. Farnsworth and C. H. Kline: Zinc Chemicals (Zinc Development Association, London, 1973) 1st ed., p. 47.
13. R. S. Wanger and W. C. Ellis: Appl. Phys. Lett. 5 (1964) 89.
14. B. D. Yao, Y. F. Chan and N. Wang: Appl. Phys. Lett. 81 (2002) 757.
15. C. X. Xu, X. W. Sun and B. J. Chen: Appl. Phys. Lett. 84 (2004) 1540.
16. N. Deepak Kumar, M. N. Kamalasanan and S. Chandra: Appl. Phys. Lett. 65 (1994) 1373.
17. Y. G. Wang, S. P. Lau, H. W. Lee, S. F. Yu, B. K. Tay, X. H. Zang and H. H. Hng: J. Appl. Phys. 94 (2003) 354.
18. M. Ishii, S. Komuro, T. Morikawa and Y. Aoyagi: J. Appl. Phys. 89 (2001) 3679.
19. T. Schmidt, G. Müller and L. Spanhel: Chem. Mater. 10 (1998) 65.
20. L. C. Chao and A. J. Steckl: Appl. Phys. Lett. 74 (1999) 2364.