Surface preparation influence on the initial stages of MOCVD growth of TiO2 thin films

Thin Solid Films

Volumn 515, Issue 2 SPEC. ISS., 2006, Pages 687-690

  Monoy, A ^a   Brevet, A ^a   Imhoff, L ^a   Domenichini, B ^a   Lesniewska, E ^b   Peterle P M ^a   Marco de Lucas, M C ^a   Bourgeois, S ^a  

^a LABORATOIRE INTERDISCIPLINAIRE CARNOT DE BOURGOGNE   (France)

^b UNIVERSITÉ DE BOURGOGNE   (France)

Author keywords

In situ analyses; MOCVD; Titanium dioxide; XPS

Indexed keywords

ATOMIC FORCE MICROSCOPY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SURFACE PROPERTIES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPOSIT MORPHOLOGY; HYDROGEN TERMINATED SURFACE; IN SITU ANALYSES; TITANIUM TETRAISOPROPOXIDE (TTIP);

TITANIUM DIOXIDE;

EID: 33748754368     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.12.237     Document Type: Article

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