Ultrafast electron diffraction at surfaces after laser excitation

Surface Science

Volumn 600, Issue 18, 2006, Pages 4094-4098

  Janzen, A ^a   Krenzer, B ^a   Zhou, P ^a   von der Linde, D ^a   Horn von Hoegen, M ^a  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

Author keywords

Bismuth; Energy dissipation; Heteroepitaxy; RHEED; Silicon; Thermal boundary conductance; Time resolved diffraction

Indexed keywords

BISMUTH; CRYSTALLINE MATERIALS; ELECTRON DIFFRACTION; ENERGY DISSIPATION; EPITAXIAL GROWTH; LASER BEAM EFFECTS; PHONONS; REFLECTION; SILICON; SURFACE PHENOMENA; THERMODYNAMIC PROPERTIES; THIN FILMS;

HEAT DIFFUSION; HETEROEPITAXY; SURFACE TEMPERATURE; THERMAL BOUNDARY CONDUCTANCE;

REFLECTION HIGH ENERGY ELECTRON DIFFRACTION;

EID: 33748714904     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2006.02.070     Document Type: Article

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