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Volumn 22, Issue 2, 2004, Pages 602-606

Influence of residual solvent in polymers patterned by nanoimprint lithography

Author keywords

[No Author keywords available]

Indexed keywords

DIFFERENTIAL SCANNING CALORIMETRY; ELECTRON BEAM LITHOGRAPHY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FREQUENCIES; GLASS TRANSITION; INSULATING MATERIALS; MACROMOLECULES; PERMITTIVITY; PLASMAS; PRINTING; SCANNING ELECTRON MICROSCOPY; SOLVENTS; SPIN COATING; THIN FILMS;

EID: 2342473907     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1651554     Document Type: Article
Times cited : (13)

References (8)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.