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Volumn 22, Issue 2, 2004, Pages 602-606
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Influence of residual solvent in polymers patterned by nanoimprint lithography
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Author keywords
[No Author keywords available]
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Indexed keywords
DIFFERENTIAL SCANNING CALORIMETRY;
ELECTRON BEAM LITHOGRAPHY;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
FREQUENCIES;
GLASS TRANSITION;
INSULATING MATERIALS;
MACROMOLECULES;
PERMITTIVITY;
PLASMAS;
PRINTING;
SCANNING ELECTRON MICROSCOPY;
SOLVENTS;
SPIN COATING;
THIN FILMS;
DYNAMIC ELECTRICAL ANALYSIS (DEA);
NANOIMPRINT LITHOGRAPHY (NIL);
PLASTICIZING EFFECTS;
POLYHYDROXYSTYRENE (PHS) BONDS;
POLYMERS;
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EID: 2342473907
PISSN: 10711023
EISSN: None
Source Type: Journal
DOI: 10.1116/1.1651554 Document Type: Article |
Times cited : (13)
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References (8)
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