Methods for processing tantalum films of controlled microstructures and properties

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 5, 2006, Pages 1948-1954

  Narayan, J ^d   Bhosle, V ^a,b   Tiwari, A ^d   Gupta, A ^d   Kumar, P ^c   Wu, R ^c  

^a North Carolina State University   (United States)

^b NORTH CAROLINA STATE UNIVERSITY   (United States)

^c HC Starck Inc   (United States)

^d NONE

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION BARRIER; RESISTIVITY MEASUREMENTS; TEMPERATURE COEFFICIENTS;

CRYSTAL STRUCTURE; DIFFUSION; ELECTRON ENERGY LOSS SPECTROSCOPY; MAGNETRON SPUTTERING; METALLIZING; MICROSTRUCTURE; MOLECULAR BEAM EPITAXY; POLYCRYSTALLINE MATERIALS; PULSED LASER DEPOSITION; TANTALUM; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

METALLIC FILMS;

EID: 33748533861     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2335863     Document Type: Article

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