Formation of ultrahigh density and ultrasmall coherent β-FeSi 2 nanodots on Si (111) substrates using Si and Fe codeposition method

Journal of Applied Physics

Volumn 100, Issue 4, 2006, Pages

  Nakamura, Yoshiaki ^a,b   Nagadomi, Yasushi ^a   Cho, Sung Pyo ^c   Tanaka, Nobuo ^c   Ichikawa, Masakazu ^a,b  

^a UNIVERSITY OF TOKYO   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c NONE

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; IRON COMPOUNDS; SILICA; SILICON; TRANSMISSION ELECTRON MICROSCOPY; ULTRATHIN FILMS;

CODEPOSITION; DISILICIDE STOICHIOMETRIC DEPOSITION RATES; ULTRAHIGH DENSITY;

NANOSTRUCTURED MATERIALS;

EID: 33748323448     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2266322     Document Type: Article

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