Effect of growth temperature on properties of ZnO thin films

Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors

Volumn 27, Issue 7, 2006, Pages 1220-1224

  Su, Hongbo ^a   Dai, Jiangnan ^a   Pu, Yong ^a   Wang, Li ^a   Li, Fan ^a   Fang, Wenqing ^a   Jiang, Fengyi ^a  

^a NANCHANG UNIVERSITY   (China)

Author keywords

DCXRD; MOCVD; PL; Strain; ZnO

Indexed keywords

ATMOSPHERIC PRESSURE; GROWTH (MATERIALS); LATTICE CONSTANTS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OPTICAL PROPERTIES; PHOTOLUMINESCENCE; STRAIN; STRUCTURE (COMPOSITION); SUBSTRATES; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

ATMOSPHERIC PRESSURE METAL ORGANIC CHEMICAL VAPOR DEPOSITION (APMOCVD); DOUBLE CRYSTAL X RAY DIFFRACTION ANALYSIS (DCXRD); OPTICAL CHARACTERISTICS;

THIN FILMS;

EID: 33748171064     PISSN: 02534177     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (12)

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