-
1
-
-
0001456055
-
"Model for expanding sheaths and surface charging at dielectric surfaces during plasma source ion implantation"
-
Mar
-
G. A. Emmert, "Model for expanding sheaths and surface charging at dielectric surfaces during plasma source ion implantation," J. Vac. Sci. Technol. B, Microelectron. Process. Phenom., vol. 12, no. 2, pp. 880-883, Mar. 1994.
-
(1994)
J. Vac. Sci. Technol. B, Microelectron. Process. Phenom.
, vol.12
, Issue.2
, pp. 880-883
-
-
Emmert, G.A.1
-
2
-
-
0032655534
-
"Mechamcal strength of cold plasma treated PET fibers"
-
Apr
-
D. Ferrante, S. Iannace, and T. Monetta, "Mechamcal strength of cold plasma treated PET fibers," J. Mater. Sci., vol. 34, no. 1, pp. 175-179, Apr. 1999.
-
(1999)
J. Mater. Sci.
, vol.34
, Issue.1
, pp. 175-179
-
-
Ferrante, D.1
Iannace, S.2
Monetta, T.3
-
3
-
-
0038554359
-
"Surface modification of poly(ethylene terephthalate) fibers induced by radio frequency air plasma treatment"
-
Apr
-
C. Riccardi, R. Barni, E. Selli, G. Mazzone, M. R. Massafra, B. Marcandalli, and G. Poletti, "Surface modification of poly(ethylene terephthalate) fibers induced by radio frequency air plasma treatment," Appl. Surf. Sci., vol. 211, no. 1-4, pp. 386-397, Apr. 2003.
-
(2003)
Appl. Surf. Sci.
, vol.211
, Issue.1-4
, pp. 386-397
-
-
Riccardi, C.1
Barni, R.2
Selli, E.3
Mazzone, G.4
Massafra, M.R.5
Marcandalli, B.6
Poletti, G.7
-
4
-
-
18144395733
-
"Plasma immersion ion implantation of insulating materials"
-
Jun
-
X. B. Tian, K. Y. Fu, P. K. Chu, and S. Q. Yang, "Plasma immersion ion implantation of insulating materials," Surf. Coat. Technol., vol. 196, no. 1-3, pp. 162-166, Jun. 2005.
-
(2005)
Surf. Coat. Technol.
, vol.196
, Issue.1-3
, pp. 162-166
-
-
Tian, X.B.1
Fu, K.Y.2
Chu, P.K.3
Yang, S.Q.4
-
5
-
-
0035151263
-
"PBII processing of dielectric layers: Physical aspects limitations and experimental results"
-
Jan
-
A. Lacoste, F. Le Coeur, Y. Arnal, J. Pelletier, and C. Grattepain, "PBII processing of dielectric layers: Physical aspects limitations and experimental results," Surf. Coat. Technol., vol. 135, no. 2/3, pp. 268-273, Jan. 2001.
-
(2001)
Surf. Coat. Technol.
, vol.135
, Issue.2-3
, pp. 268-273
-
-
Lacoste, A.1
Le Coeur, F.2
Arnal, Y.3
Pelletier, J.4
Grattepain, C.5
-
6
-
-
1842608527
-
"Effects of mesh-assisted carbon plasma immersion ion implantation on the surface properties of insulating silicon carbide ceramics"
-
Mar
-
R. K. Y. Fu, F. Ka Leung, T. Xiubo, and P. K. Chu, "Effects of mesh-assisted carbon plasma immersion ion implantation on the surface properties of insulating silicon carbide ceramics," J. Vac. Sci. Technol. A, Vac. Surf. Films, vol. 22, no. 2, pp. 356-360, Mar. 2004.
-
(2004)
J. Vac. Sci. Technol. A, Vac. Surf. Films
, vol.22
, Issue.2
, pp. 356-360
-
-
Fu, R.K.Y.1
Ka Leung, F.2
Xiubo, T.3
Chu, P.K.4
-
7
-
-
0030288186
-
"Plasma immersion ion implantation - A fledgling technique for semiconductor processing"
-
Nov
-
P. K. Chu, S. Qin, C. Chan, N. W. Cheung, and L. A. Larson, "Plasma immersion ion implantation - A fledgling technique for semiconductor processing," Mater. Sci. Eng., R Rep., vol. R17, no. 6/7, pp. 207-280, Nov. 1996.
-
(1996)
Mater. Sci. Eng., R Rep.
, vol.R17
, Issue.6-7
, pp. 207-280
-
-
Chu, P.K.1
Qin, S.2
Chan, C.3
Cheung, N.W.4
Larson, L.A.5
-
8
-
-
0038751585
-
"Computer simulation of plasma for plasma immersed ion implantation and deposition with bipolar pulses"
-
May
-
Y. Miyagawa, M. Ikeyama, S. Miyagawa, and H. Nakadate, "Computer simulation of plasma for plasma immersed ion implantation and deposition with bipolar pulses," Nucl. Instrum. Methods Phys. Res. B, Beam Interact. Mater. At., vol. 206, pp. 767-771, May 2003.
-
(2003)
Nucl. Instrum. Methods Phys. Res. B, Beam Interact. Mater. At.
, vol.206
, pp. 767-771
-
-
Miyagawa, Y.1
Ikeyama, M.2
Miyagawa, S.3
Nakadate, H.4
-
9
-
-
0345872342
-
"Implantation dynamics of plasma implantation into insulating strips"
-
Jan
-
T. Xiubo, Y. Shiqin, H. Yongxian, P. K. Chu, and R. K. Y. Fu, "Implantation dynamics of plasma implantation into insulating strips," J. Phys. D, Appl. Phys., vol. 37, no. 1, pp. 50-54, Jan. 2004.
-
(2004)
J. Phys. D, Appl. Phys.
, vol.37
, Issue.1
, pp. 50-54
-
-
Xiubo, T.1
Shiqin, Y.2
Yongxian, H.3
Chu, P.K.4
Fu, R.K.Y.5
-
10
-
-
0037525364
-
"Electric probe measurements of high-voltage sheath collapse in cathodic arc plasmas due to surface charging of insulators"
-
Jun
-
T. W. H. Oates, J. Pigott, D. R. McKenzie, and M. M. M. Bilek, "Electric probe measurements of high-voltage sheath collapse in cathodic arc plasmas due to surface charging of insulators," IEEE Trans. Plasma Sci., vol. 31, no. 3, pp. 438-443, Jun. 2003.
-
(2003)
IEEE Trans. Plasma Sci.
, vol.31
, Issue.3
, pp. 438-443
-
-
Oates, T.W.H.1
Pigott, J.2
McKenzie, D.R.3
Bilek, M.M.M.4
-
11
-
-
19144366346
-
"Numerical simulation of metal plasma-immersion ion implantation and deposition on a cone"
-
Dec
-
C. Cornet, D. T. K. Kwok, M. M. M. Bilek, and D. R. McKenzie, "Numerical simulation of metal plasma-immersion ion implantation and deposition on a cone," J. Appl. Phys., vol. 96, no. 11, pp. 6045-6052, Dec. 2004.
-
(2004)
J. Appl. Phys.
, vol.96
, Issue.11
, pp. 6045-6052
-
-
Cornet, C.1
Kwok, D.T.K.2
Bilek, M.M.M.3
McKenzie, D.R.4
-
12
-
-
0141893394
-
"Determination of the equilibrium steady ion sheath in drifting plasma"
-
D. T. K. Kwok, T. W. H. Oates, D. R. McKenzie, and M. M. M. Bilek, "Determination of the equilibrium steady ion sheath in drifting plasma," in Proc. IEEE Conf. Rec. Abstracts. 30th Int. Conf. Plasma Sci. (Cat. No.03CH37470), 2003, p. 338.
-
(2003)
Proc. IEEE Conf. Rec. Abstracts. 30th Int. Conf. Plasma Sci. (Cat. No.03CH37470)
, pp. 338
-
-
Kwok, D.T.K.1
Oates, T.W.H.2
McKenzie, D.R.3
Bilek, M.M.M.4
-
13
-
-
0037464228
-
"The importance of bias pulse rise time for determining shallow implanted dose in plasma immersion ion implantation"
-
Mar
-
D. T. K. Kwok, M. M. M. Bilek, D. R. McKenzie, and P. K. Chu, "The importance of bias pulse rise time for determining shallow implanted dose in plasma immersion ion implantation," Appl. Phys. Lett., vol. 82, no. 12, pp. 1827-1829, Mar. 2003.
-
(2003)
Appl. Phys. Lett.
, vol.82
, Issue.12
, pp. 1827-1829
-
-
Kwok, D.T.K.1
Bilek, M.M.M.2
McKenzie, D.R.3
Chu, P.K.4
-
14
-
-
4344596520
-
"Disturbance of a Langmuir probe at the steady-State sheath boundary in a drifting plasma"
-
Apr
-
D. T. K. Kwok, M. M. M. Bilek, D. R. McKenzie, T. W. H. Oates, and P K. Chu, "Disturbance of a Langmuir probe at the steady-State sheath boundary in a drifting plasma," IEEE Trans. Plasma Sci., vol. 32, no. 2, pp. 422-428, Apr. 2004.
-
(2004)
IEEE Trans. Plasma Sci.
, vol.32
, Issue.2
, pp. 422-428
-
-
Kwok, D.T.K.1
Bilek, M.M.M.2
McKenzie, D.R.3
Oates, T.W.H.4
Chu, P.K.5
-
17
-
-
0035254332
-
"Width, structure and stability of sheaths in metal plasma immersion ion implantation and deposition: Measurements and analytical considerations"
-
Feb
-
A. Anders, "Width, structure and stability of sheaths in metal plasma immersion ion implantation and deposition: Measurements and analytical considerations," Surf. Coat. Technol., vol. 136, no. 1-3, pp. 85-92, Feb. 2001.
-
(2001)
Surf. Coat. Technol.
, vol.136
, Issue.1-3
, pp. 85-92
-
-
Anders, A.1
-
18
-
-
33750397200
-
"Langmuir probe measurements of drifting pulsed arc plasma"
-
in Batemans Bay, Australia: Murramarang Resort
-
M. Proschek, R. N. Tarrant, L. Ryves, D. R. McKenzie, and M. M. M. Bilek, "Langmuir probe measurements of drifting pulsed arc plasma," in Proc. 13th Gaseous Electronics Meeting. Batemans Bay, Australia: Murramarang Resort, 2004, p. 51.
-
(2004)
Proc. 13th Gaseous Electronics Meeting
, pp. 51
-
-
Proschek, M.1
Tarrant, R.N.2
Ryves, L.3
McKenzie, D.R.4
Bilek, M.M.M.5
-
19
-
-
33748096852
-
-
Scientists of the Plasma Laboratory of City University of Hong Kong, private communication
-
Scientists of the Plasma Laboratory of City University of Hong Kong, private communication.
-
-
-
-
21
-
-
36449008738
-
"Numerical simulation of plasma sheath expansion, with applications to plasma-source ion implantation"
-
Jan
-
G. A. Emmert and M. A. Henry, "Numerical simulation of plasma sheath expansion, with applications to plasma-source ion implantation," J. Appl. Phys., vol. 71, no. 1, pp. 113-117, Jan. 1992.
-
(1992)
J. Appl. Phys.
, vol.71
, Issue.1
, pp. 113-117
-
-
Emmert, G.A.1
Henry, M.A.2
-
23
-
-
36549093245
-
"Electron emission from glow-discharge cathode materials due to neon and argon ion bombardment"
-
May
-
B. Szapiro and J. J. Rocca, "Electron emission from glow-discharge cathode materials due to neon and argon ion bombardment," J. Appl. Phys., vol. 65, no. 9, pp. 3713-3716, May 1989.
-
(1989)
J. Appl. Phys.
, vol.65
, Issue.9
, pp. 3713-3716
-
-
Szapiro, B.1
Rocca, J.J.2
|