Plasma immersion ion implantation of insulating materials

Surface and Coatings Technology

Volumn 196, Issue 1-3 SPEC. ISS., 2005, Pages 162-166

  Tian, X B ^a,b   Fu, K Y ^b   Chu, Paul K ^b   Yang, S Q ^a  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Insulating materials; Metal mesh; Plasma immersion ion implantation

Indexed keywords

CAPACITANCE; COMPUTER SIMULATION; ION IMPLANTATION; MATHEMATICAL MODELS; PLASMAS; SEMICONDUCTOR MATERIALS;

IMPLANTATION ENERGY; PARTICLE-IN-CELL (PIC) MODELS; PLASMA IMMERSION ION IMPLANTATION (PIII); SURFACE CHARGING;

ELECTRIC INSULATING MATERIALS;

INSULATION;

EID: 18144395733     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.08.166     Document Type: Article

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