Influence of O2 flow rate on structure and properties of MgOx films prepared by cathodic-vacuum-arc ion deposition system

IEEE Transactions on Plasma Science

Volumn 34, Issue 4 I, 2006, Pages 1099-1104

  Zheng, Changxi ^a   Zhu, Daoyun ^a   Chen, Dihu ^a   He, Zhenhui ^a   Wen, Lishi ^a   Cheung, W Y ^b   Wong, S P ^b  

^a SUN YAT SEN UNIVERSITY   (China)

^b CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

MgO films; Plasma display panel (PDP); Vacuum arc; X ray diffraction (XRD)

Indexed keywords

ABSORPTION SPECTROSCOPY; ATOMIC FORCE MICROSCOPY; CRYSTAL MICROSTRUCTURE; DEPOSITION; GRAIN SIZE AND SHAPE; MORPHOLOGY; OPTICAL PROPERTIES; PLASMA DISPLAY DEVICES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; X RAY DIFFRACTION ANALYSIS;

CATHODIC-VACUUM-ARC ION DEPOSITION SYSTEM; PLASMA DISPLAY PANEL (PDP);

MAGNESIA;

EID: 33748111493     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2006.876488     Document Type: Article

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