The optics of photomasks: From shadowy past to scattered future

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 I, Issue , 2006, Pages

  Progler, Christopher J ^a  

^a PHOTRONICS INC   (United States)

Author keywords

Immersion lithography; Lithography; Photomask; Resolution enhancement; Scattering

Indexed keywords

IMMERSION LITHOGRAPHY; PHOTOMASKS; RESOLUTION ENHANCEMENT;

DIFFRACTIVE OPTICS; IMAGING SYSTEMS; OPTICAL DEVICES; OPTICAL SYSTEMS; PHOTOLITHOGRAPHY; SCATTERING;

MASKS;

EID: 33745769744     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.663291     Document Type: Conference Paper

References (8)

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