Diffusion processes in seeded and unseeded SBT thin films with varied stoichiometry

Surface Science

Volumn 600, Issue 9, 2006, Pages 1780-1786

  Gonzalez Aguilar G ^a   Wu, A ^a   Reis, M A ^b   Ramos, A R ^b   Miranda Salvado, I M ^a   Alves, E ^b   Costa, M E V ^a  

^a UNIVERSITY OF AVEIRO   (Portugal)

^b INSTITUTO TECNOLÓGICO E NUCLEAR   (Portugal)

Author keywords

Ferroelectric films; Metal oxide interfaces; Rutherford backscattering spectrometry (RBS); Surface chemical reaction; Surface diffusion; Thin film structures

Indexed keywords

DIFFUSION; FERROELECTRICITY; HYSTERESIS; PEROVSKITE; PIEZOELECTRICITY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; STOICHIOMETRY;

FERROELECTRIC FILMS; METAL OXIDE INTERFACES; PARTICLE INDUCED X-RAY EMISSION (PIXE); SURFACE CHEMICAL REACTION; SURFACE DIFFUSION; THIN FILM STRUCTURES;

THIN FILMS;

EID: 33748043996     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2006.01.051     Document Type: Article

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