Enhanced electron injection into tris(8-hydroxyquinoline) aluminum (Alq3) thin films by tetrathianaphthacene (TTN) doping revealed by current-voltage characteristics

Chemical Physics Letters

Volumn 423, Issue 1-3, 2006, Pages 170-173

  Wang, S D ^a   Kanai, K ^a   Kawabe, E ^a   Ouchi, Y ^a   Seki, K ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; CHARGE CARRIERS; CURRENT VOLTAGE CHARACTERISTICS; DOPING (ADDITIVES); ELECTRON ENERGY LEVELS; THIN FILMS;

CARRIER INJECTION; ELECTRON INJECTION; SPACE-CHARGE-LIMITED CURRENT (SCLC); TETRATHIANAPHTHACENE (TTN);

ELECTRONIC STRUCTURE;

EID: 33747891999     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cplett.2006.03.064     Document Type: Article

References (22)

1. Burrows P.E., Shen Z., Bulovic V., McCarty D.M., Forrest S.R., Cronin J.A., and Thompson M.E. J. Appl. Phys. 79 (1996) 7991
2. Parthasarathy G., Burrows P.E., Khalfin V., Kozlov V.G., and Forrest S.R. Appl. Phys. Lett. 72 (1998) 2138
3. Ogawa T., Cho D.C., Kaneko K., Mori T., and Mizutani T. Thin Solid Films 438-439 (2003) 171
4. Matsumura M., Akai T., Saito M., and Kimura T. J. Appl. Phys. 79 (1996) 264
5. Ioannidis A., Forsythe E., Gao Y.L., Wu M.W., and Conwell E.M. Appl. Phys. Lett. 72 (1998) 3038
6. Barth S., Wolf U., Bässler H., Muller P., Riel H., Vestweber H., Seidler P.F., and Rieß W. Phys. Rev. B 60 (1999) 8791
7. Campbell I.H., and Smith D.L. Appl. Phys. Lett. 74 (1999) 561
8. Shen C., Kahn A., and Schwartz J. J. Appl. Phys. 89 (2001) 449
9. Kiy M., Losio P., Biaggio I., Koehler M., Tapponnier A., and Günter P. Appl. Phys. Lett. 80 (2002) 1198
10. Mahapatro A.K., and Ghosh S. Appl. Phys. Lett. 80 (2002) 4840
11. Palilis L.C., Uchida M., and Kafafi Z.H. IEEE J. Select. Topics Quantum Electron. 10 (2004) 79
12. Zhou X., Pfeiffer M., Blochwitz J., Werner A., Nollau A., Fritz T., and Leo K. Appl. Phys. Lett. 78 (2001) 410
13. Gao W., and Kahn A. Org. Electron. 3 (2002) 53
14. Gao W., and Kahn A. J. Appl. Phys. 94 (2003) 359
15. Nollau A., Pfeiffer M., Fritz T., and Leo K. J. Appl. Phys. 87 (2000) 4340
16. Sato N., Inokuchi H., and Shirotani I. Chem. Phys. 60 (1981) 327
17. Tanaka S., Kawabe E., Kanai K., Iwahashi T., Nishi T., Ouchi Y., and Seki K. J. Electron Spect. Related Phenom. 144-147 (2005) 533
18. Marschalk C., and Stumm C. Bull. Soc. Chim., France 418 (1948)
19. Sze S.M. Physics of Semiconductor Devices (1981), Wiley, New York
20. Scott J.C., and Malliaras G.G. Chem. Phys. Lett. 299 (1999) 115
21. Ishii H., Sugiyama K., Ito E., and Seki K. Adv. Mater. 11 (1999) 605
22. Lampert M.A., and Mark P. Current Injection in Solids (1970), Academic Press, New York