Observation of the Mott-Gurney law in tris (8-hydroxyquinoline) aluminum films

Applied Physics Letters

Volumn 80, Issue 7, 2002, Pages 1198-1200

  Kiy, M ^a   Losio, P ^a   Biaggio, I ^a   Koehler, M ^a   Tapponnier, A ^a   Gunter P ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED ELECTRIC FIELD; APPLIED VOLTAGES; EXPONENTIAL DISTRIBUTIONS; HIGH FIELD; INJECTED CURRENT; MOTT-GURNEY LAW; SPACE-CHARGE-LIMITED; TRAP ENERGY; TRIS(8-HYDROXYQUINOLINE) ALUMINUM; ULTRAHIGH VACUUM CONDITIONS;

ALUMINUM; AMORPHOUS MATERIALS; ELECTRIC FIELDS; ELECTRON MOBILITY;

CURRENT VOLTAGE CHARACTERISTICS;

EID: 79955993304     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1449527     Document Type: Article

References (26)

1. M. A. Lampert and P. Mark, Current Injection in Solids (Academic, New York, 1970).
2. J. H. Schön, C. Kloc, R. A. Laudise, and B. Batlogg, Appl. Phys. Lett. 73, 3574 (1998). apl APPLAB 0003-6951
3. J. H. Schön, C. Kloc, R. A. Laudise, and B. Batlogg, Phys. Rev. B 58, 12952 (1998). prb PRBMDO 0163-1829
4. M. A. Lampert, Phys. Rev. 103, 1648 (1956). phr PHRVAO 0031-899X
5. M. A. Lampert, Proc. IRE 50, 1781 (1962). pir PIREAE 0096-8390
6. N. F. Mott and R. W. Gurney, Electronic Processes in Ionic Crystals (Oxford University Press, New York, 1940).
7. A. Rose, Phys. Rev. 97, 1538 (1954). phr PHRVAO 0031-899X
8. W. Brütting, S. Berleb, and A. G. Mückl, Org. Electr. 2, 1 (2001).
9. I. H. Campbell and D. L. Smith, Appl. Phys. Lett. 74, 561 (1999). apl APPLAB 0003-6951
10. M. Stössel, J. Staudigel, F. Steuber, J. Blässing, J. Simmerer, and A. Winnacker, Appl. Phys. Lett. 76, 115 (2000). apl APPLAB 0003-6951
11. J. Staudigel, M. Stössel, F. Steuber, J. Blässing, and J. Simmerer, Synth. Met. 111-112, 69 (2000). sym SYMEDZ 0379-6779
12. M. Stössel, J. Staudigel, F. Steuber, J. Blässing, J. Simmerer, A. Winnacker, H. Neuner, D. Metzdorf, H.-H. Johannes, and W. Kowalsky, Synth. Met. 111-112, 19 (2000). sym SYMEDZ 0379-6779
13. W. Brütting, S. Berleb, and A. G. Mückl, Synth. Met. 122, 99 (2001). sym SYMEDZ 0379-6779
14. H. Heil, J. Steiger, S. Karg, M. Gastel, H. Ortner, H. von Seggern, and M. Stössel, J. Appl. Phys. 89, 420 (2001). jap JAPIAU 0021-8979
15. S. Berleb, A. G. Mückl, W. Brütting, and M. Schwoerer, Synth. Met. 111-112, 341 (2000). sym SYMEDZ 0379-6779
16. S. Barth, P. Müller, H. Riel, P. F. Seidler, W. Riess, H. Vestweber, U. Wolf, and H. Bässler, Synth. Met. 111-112, 327 (2000). sym SYMEDZ 0379-6779
17. U. Wolf, S. Barth, and H. Bässler, Appl. Phys. Lett. 75, 2035 (1999). apl APPLAB 0003-6951
18. M. Kiy, I. Gamboni, U. Suhner, I. Biaggio, and P. Günter, Synth. Met. 111-112, 307 (2000). sym SYMEDZ 0379-6779
19. M. Kiy, I. Biaggio, and P. Günter, Nonlinear Opt. 25, 461 (2001). mck MCLOEB 1058-7268
20. M. Kiy, I. Gamboni, I. Biaggio, and P. Günter, Proc. SPIE 4105, 291 (2001). spi PSISDG 0277-786X
21. C. Shen, I. G. Hill, and A. Kahn, Adv. Mater. 11, 1523 (1999). amt ADVMEW 0935-9648
22. R. G. Kepler, P. M. Beeson, S. J. Jacobs, R. A. Anderson, M. B. Sinclair, V. S. Valencia, and P. A. Cahill, Appl. Phys. Lett. 66, 3618 (1995). apl APPLAB 0003-6951
23. B. Chen and S. Liu, Synth. Met. 91, 169 (1997). sym SYMEDZ 0379-6779
24. S. Barth, P. Müller, H. Riel, P. F. Seidler, W. Riess, H. Vestweber, and H. Bässler, J. Appl. Phys. 89, 3711 (2001). jap JAPIAU 0021-8979
25. S. Hayashi, T. T. Wang, S. Matsuoka, and S. Saito, Mol. Cryst. Liq. Cryst. 135, 355 (1986). mcl MCLCA5 0026-8941
26. D. Ma, I. A. Hummelgen, B. Hu, F. E. Karasz, X. Jing, L. Wang, and F. Wang, Solid State Commun. 112, 251 (1999). ssc SSCOA4 0038-1098