Measurement of residual stress in DLC films prepared by plasma-based ion implantation and deposition

Surface and Coatings Technology

Volumn 186, Issue 1-2 SPEC. ISS., 2004, Pages 141-145

  Oka, Yoshihiro ^a   Kirinuki, Michiharu ^a   Nishimura, Yoshimi ^a,b   Azuma, Kingo ^a   Fujiwara, Etsuo ^a   Yatsuzuka, Mitsuyasu ^a  

^a UNIVERSITY OF HYOGO   (Japan)

^b Kurita Seisakusho Co Ltd   (Japan)

Author keywords

DLC; Hybrid process; Plasma based ion implantation and deposition (PBIID); Residual stress

Indexed keywords

ACETYLENE; FILM GROWTH; ION IMPLANTATION; PLASMA APPLICATIONS; RESIDUAL STRESSES; TOLUENE;

COMPRESSIVE RESIDUAL STRESS; NEGATIVE PULSED VOLTAGE; PLASMA BASED ION IMPLANTATION AND DEPOSITION (PBIID); THERMAL SPIKE EFFECT;

DIAMOND LIKE CARBON FILMS;

ION IMPLANTATION;

EID: 17644369646     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.04.010     Document Type: Article

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