A CMOS-compatible bulk technology for the fabrication of magnetically actuated microbalances for chemical sensing

Sensors and Actuators, B: Chemical

Volumn 118, Issue 1-2, 2006, Pages 343-348

  Nannini, A ^a   Paci, D ^a,b   Pieri, F ^a   Toscano, P ^a  

^a UNIVERSITY OF PISA   (Italy)

^b CNR   (Italy)

Author keywords

Chemical sensor; Magnetic actuation; TMAH; Torsional microbalance

Indexed keywords

ADSORPTION; CMOS INTEGRATED CIRCUITS; ETCHING; PRODUCT DESIGN; RESONANCE; SILICA; SPRINGS (COMPONENTS);

MAGNETIC ACTUATION; POST PROCESSING; TMAH; TORSIONAL MICROBALANCE;

CHEMICAL SENSORS;

EID: 33747834339     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.snb.2006.04.059     Document Type: Article

References (13)

1. Battiston F.M., Ramseyer J.-P., Lang H.P., Baller M.K., Gerber Ch., Gimzewski J.K., Meyer E., and Güntherodt H.-J. A chemical sensor based on a microfabricated cantilever array with simultaneous resonance-frequency and bending readout. Sens. Actuators B, Chem. B77 (2001) 122-131
2. Paci D., Kirstein K.-U., Vancura C., Lichtenberg J., and Baltes H. A behavioural model of resonant cantilevers for chemical sensing. Analog Integrated Circuits Signal Process. 44 (2005) 119-128
3. Davis Z.J., Abadal G., Kuhn O., Hansen O., Grey F., and Boisen A. Fabrication and characterization of nanoresonating devices for mass detection. J. Vac. Sci. Technol. B 18 (2000) 612-616
4. Di Nucci C., Fort A., Rocchi S., Tondi L., Vignoli V., Di Francesco F., and Belén Serrano Santos M. A measurement system for odor classification based on the dynamic response of QCM sensors. IEEE Trans. Trans. Instrum. Meas. 52 (2003) 1079-1086
5. Atashbar M.Z., Bejcek B., Vijh A., and Singamaneni S. QCM biosensor with ultra thin polymer film. Sens. Actuators B, Chem. B107 (2005) 945-951
6. Yan G., Chan P.C.H., Hsing I.-M., Sharma R.K., Sin J.K.O., and Wang Y. An improved TMAH Si-etching solution without attacking exposed aluminum. Sens. Actuators A, Phys. A89 (2001) 135-141
7. Fujitsuka N., Hamaguchi K., Funabashi H., Kawasaki E., and Fukada T. Silicon anisotropic etching without attacking aluminum with Si and oxidizing agent dissolved in TMAH solution. Sens. Actuators A, Phys. A114 (2004) 510-515
8. Gere J.M., and Timoshenko S.P. Mechanics of Materials (1991), Chapman & Hall, London
9. Pirrung M.C. How to make a DNA chip. Angew. Chem. Int. Ed. 41 (2002) 1276-1289
10. Tilmans H.A.C. Equivalent circuit representation of electromechanical transducers: I. Lumped-parameter systems. J. Micromech. Microeng. 6 (1996) 157-176
11. Biswas K., Das S., Maurya D.K., and Lahiri S.K. Bulk micromachining of silicon in TMAH-based etchants for aluminum passivation and smooth surface. Microelectron. J. 37 (2006) 321-327
12. Brida S., Faes A., Guarnieri V., Giacomozzi F., Margesin B., Paranjape M., Pignatel G.U., and Zen M. Microstructures etched in doped TMAH solutions. Microelectron. Eng. 53 (2000) 547-551
13. Tabata O. pH-controlled TMAH etchants for silicon micromachining. Sens. Actuators A Phys. A53 (1996) 335-339