Plasma-assisted metalorganic chemical vapor deposition growth of ZnO thin films

Journal of Materials Research

Volumn 21, Issue 7, 2006, Pages 1632-1637

  Losurdo, Maria ^a   Giangregorio, Maria M ^a   Sacchetti, A ^a   Capezzuto, Pio ^a   Bruno, Giovanni ^a   Malandrino, Graziella ^b   Fragalà, Ignazio L ^b  

^a CNR   (Italy)

^b UNIVERSITY OF CATANIA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC PROPERTIES; EXCITONS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; OPTICAL PROPERTIES; SAPPHIRE; SILICON; THIN FILMS;

TETRAMETHYLETHYLENDIAMINE PRECURSOR; THENOYLTRIFLUOROACETONATE;

ZINC OXIDE;

EID: 33747513206     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2006.0221     Document Type: Article

References (12)

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