Synthesis of nitrogen-rich carbon nitride thin films via magnetic field-assisted inductively coupled plasma sputtering

Vacuum

Volumn 80, Issue 7 SPEC. ISS., 2006, Pages 752-755

  Ohta, R ^a   Yokota, T ^a   Anita, V ^b   Saito, N ^a   Takai, O ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b ALEXANDRU IOAN CUZA UNIVERSITY OF IASI   (Romania)

Author keywords

External magnetic field; Inductively coupled plasma sputtering; Nitrogen rich carbon nitride; Plasma state

Indexed keywords

CARBON NITRIDE; CARRIER CONCENTRATION; INDUCTIVELY COUPLED PLASMA; MAGNETIC FIELD EFFECTS; NITROGEN; SYNTHESIS (CHEMICAL);

EXTERNAL MAGNETIC FIELD; INDUCTIVELY COUPLED PLASMA SPUTTERING; NITROGEN-RICH CARBON NITRIDE; PLASMA STATE;

THIN FILMS;

EID: 33747446924     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2005.11.042     Document Type: Article

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