Synthesis of carbon nitride films by high-density helicon wave-excited plasma sputtering

Surface and Coatings Technology

Volumn 142-144, Issue , 2001, Pages 874-880

  Setsuhara, Y ^a   Sakawa, Y ^b   Shoji, T ^b   Kumagai, M ^c   Mikaye, S ^a  

^a OSAKA UNIVERSITY   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

^c KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Carbon nitride film; Helicon plasma; High density nitrogen plasma; Optical emission spectra; Plasma sputtering

Indexed keywords

CARBON; DEPOSITION; EMISSION SPECTROSCOPY; FILMS; INFRARED SPECTROSCOPY; NITRIDES; SYNTHESIS (CHEMICAL);

CARBON NITRIDE FILMS;

COATING TECHNIQUES;

FILM;

EID: 0035386691     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01119-7     Document Type: Article

References (12)