Microcrystalline silicon-carbon films deposited by silane-methane mixture highly diluted in hydrogen

Thin Solid Films

Volumn 511-512, Issue , 2006, Pages 399-403

  Coscia, U ^a   Ambrosone, G ^a   Lettieri, S ^a   Maddalena, P ^a   Ferrero, S ^b  

^a UNIVERSITY OF NAPLES FEDERICO II   (Italy)

^b POLITECNICO DI TORINO   (Italy)

Author keywords

Microcrystalline silicon carbon; RF PECVD; Silicon carbon alloys

Indexed keywords

CRYSTALLINE MATERIALS; ELECTRIC CONDUCTIVITY; FILM GROWTH; PHASE TRANSITIONS; PHOTOLUMINESCENCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON ALLOYS;

GAS MIXTURES; MICROCRYSTALLINE FILMS; MICROCRYSTALLINE SILICON-CARBON ALLOYS; RF-PECVD;

THIN FILMS;

EID: 33747432882     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.12.084     Document Type: Article

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