Deposition of microcrystalline silicon-carbon alloys in low power regime

Journal of Non-Crystalline Solids

Volumn 338-340, Issue 1 SPEC. ISS., 2004, Pages 163-167

  Ambrosone, G ^a   Barucca, G ^b   Coscia, U ^a   Ferrero, S ^c   Lettieri, S ^a   Maddalena, P ^a  

^a INFM   (Italy)

^b UNIVERSITÀ POLITECNICA DELLE MARCHE   (Italy)

^c POLITECNICO DI TORINO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CAMERAS; CHARGE COUPLED DEVICES; CRYSTALLINE MATERIALS; ELECTRIC CONDUCTIVITY; ENERGY GAP; HYDROGENATION; LIGHT EMITTING DIODES; METALLIC FILMS; PHASE TRANSITIONS; PHOTOLUMINESCENCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SPECTROPHOTOMETERS; TRANSMISSION ELECTRON MICROSCOPY;

ABSORPTION COEFFICIENT; HYDROGEN DILUTION; MICROCRYSTALLINE ALLOYS; STRUCTURAL VARIATIONS;

SILICON ALLOYS;

EID: 2942615158     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2004.02.045     Document Type: Conference Paper

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