Microstructure and photoluminescence properties of as-deposited and annealed Si-rich a-Si 1-x C x :H films

Applied Surface Science

Volumn 180, Issue 1-2, 2001, Pages 87-91

  Wang, Yan ^a   Yue, Ruifeng ^a   Li, Guohua ^b   Han, Hexiang ^b   Liao, Xianbo ^b  

^a TSINGHUA UNIVERSITY   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

a Si 1 x C x :H film; Annealing; Photoluminescence; Raman spectroscopy; X ray diffraction

Indexed keywords

ANNEALING; CRYSTAL MICROSTRUCTURE; HYDROGENATION; PHOTOLUMINESCENCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SILICON CARBIDE; X RAY DIFFRACTION ANALYSIS;

HIGH TEMPERATURE ANNEALING;

OPTICAL FILMS;

EID: 0035426776     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00334-8     Document Type: Article

References (19)