Development and application of UV excimer lamps from 354 - 126 nm

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6261 I, Issue , 2006, Pages

  Boyd, Ian W ^a   Liaw, Irving I ^a  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

Dielectric barrier discharge; Excimer lamps; Silent discharges; Ultraviolet radiation; Ultraviolet sources

Indexed keywords

COMPUTATIONAL GEOMETRY; ELECTRIC DISCHARGES; EXCIMER LASERS; INDUSTRIAL APPLICATIONS; PHOTONS; PULSED LASER DEPOSITION; SURFACE PROPERTIES; THIN FILMS; ULTRAVIOLET RADIATION;

DIELECTRIC-BARRIER DISCHARGE; EXCIMER LAMPS; SILENT DISCHARGES; ULTRAVIOLET SOURCES;

ULTRAVIOLET LAMPS;

EID: 33747374850     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.686233     Document Type: Conference Paper

References (31)

1. N. G. Basov, V. A. Danilychev, Y. Popov, and D. D. Khodkevich, "Laser operating in the vacuum region of the spectrum by excitation of liquid xenon with an electron beam," JETP Lett. 12, pp. 329-331, 1970.
2. S. K. Searles and G. A. Hart, "Stimulated emission at 281.8 nm from xebr," Applied Physics Letters 27(4), pp. 243-245, 1975.
3. C. Rhodes, "Review of ultraviolet laser physics," Quantum Electronics, IEEE Journal of 10(2), pp. 153-174, 1974.
4. C. Rhodes, Excimer Lasers, vol. 30 of Topics in Applied Physics, Springer, New York, 2nd ed., 1984.
5. D. Basting and G. Marowsky, Excimer Laser Technology, Springer, 1 ed., 2005.
6. J.-Y. Zhang and I. W. Boyd, "Efficient excimer ultraviolet sources from a dielectric barrier discharge in rare-gas/halogen mixtures," Journal of Applied Physics 80(2), pp. 633-638, 1996.
7. U. Kogelschatz, "Silent discharges for the generation of ultraviolet and vacuum ultraviolet excimer radiation," Pure & Appl. Chem 62(9), pp. 1667-1674, 1990.
8. U. Kogelschatz, H. Esrom, J. Y. Zhang, and I. W. Boyd, "High-intensity sources of incoherent uv and vuv excimer radiation for low-temperature materials processing," Applied Surface Science 168(1-4), pp. 29-36, 2000.
9. U. Kogelschatz, "Dielectric-barrier discharges: Their history, discharge physics, and industrial applications," Plasma Chemistry and Plasma Processing 23(1), pp. 1-46, 2003.
10. U. Kogelschatz, "Excimer lamps: history, discharge physics, and industrial applications," in Atomic and Molecular Pulsed Lasers V, V. F. Tarasenko, ed., 5483, pp. 272-286, SPIE, 2004.
11. U. Kogelschatz, "Industrial innovation based on fundamental physics*," Plasma Sources Science and Technology (3A), pp. A1-A6, 2002.
12. V. F. Tarasenko, "Excilamps as efficient uv-vuv light sources, " Pure & Appl. Chem 74(3), pp. 465-469, 2002.
13. I. W. Boyd and J. Y. Zhang, "New large area ultraviolet lamp sources and their applications," Nuclear Instrumente and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 121(1-4), pp. 349-356, 1997.
14. I. W. Boyd and J.-Y. Zhang, "Photo-induced growth of dielectrics with excimer lamps," Solid-State Electronics 45(8), pp. 1413-1431, 2001.
15. M. Heise, W. Neff, O. Franken, P. Muranyi, and J. Wunderlich, "Sterilization of polymer foils with dielectric barrier discharges at atmospheric pressure," Plasmas and Polymers 9(1), pp. 23-33, 2004.
16. B. Gellert and U. Kogelschatz, "Generation of excimer emission in dielectric barrier discharges," Applied Physics B: Lasers and Optics 52(1), pp. 14-21, 1991.
17. J.-Y. Zhang and I. W. Boyd, "Efficient xei* excimer ultraviolet sources from a dielectric barrier discharge," Journal of Applied Physics 84(3), pp. 1174-1178, 1998.
18. S. Liu and M. Neiger, "Double discharges in unipolar-pulsed dielectric barrier discharge xenon excimer lamps," Journal of Physics D: Applied Physics (13), pp. 1565-1572, 2003.
19. R. J. Carman and R. P. Mildren, "Computer modelling of a short-pulse excited dielectric barrier discharge xenon excimer lamp," Journal of Physics D: Applied Physics (1), pp. 19-33, 2003.
20. H. Esrom and U. Kogelschatz, "Metal deposition with a windowless vuv excimer source," Applied Surface Science 54, pp. 440-444, 1992.
21. C. Elsner, M. Lenk, L. Prager, and R. Mehnert, "Windowless argon excimer source for surface modification," Applied Surface Science 252(10), pp. 3616-3624, 2006.
22. M. F. Golde and A. Kvaran, "Cherniluminescence of argon bromide, i. the emission spectrum of arbr," The Journal of Chemical Physics 72(1), pp. 434-441, 1980.
23. C. Chaneliere, J. L. Autran, R. A. B. Devine, and B. Balland, "Tantalum pentoxide thin films for advanced dielectric applications," Mater. Sci. Eng. R-Rep. 22(6), pp. 269-322, 1998.
24. C. J. Brinker and G. W. Scherer, The Physics and Chemistry of Sol-Gel Processing, Academic Press, London, 1990.
25. D. Chrisey and G. Hubler, Pulsed Laser Deposition of Thin Films, Wiley, New York, 1994.
26. J.-Y. Zhang and I. Boyd, "Low temperature photo-oxidation of silicon using deep uv radiation," Electronics Letters 32(22), pp. 2097-2098, 1996.
27. D. Matter, H. Burtscher, U. Kogelschatz, L. Scherrer, and H. C. Slegmann, "Using photoemission caused by excimer uv-radiation sources to characterize soot particles," Journal of Aerosol Science 24(Supplement 1), pp. S365-S366, 1993.
28. S. L. Miller and J. M. MacHer, "Evaluation of a methodology for quantifying the effect of room air ultraviolet germicidal irradiation on airborne bacteria," Aerosol Science & Technology 33(3), pp. 274-295, 2000.
29. W. J. Kowalski, W. P. Bahnfleth, D. L. Witham, B. F. Severin, and T. S. Whittam, "Mathematical modeling of ultraviolet germicidal irradiation for air disinfection," Quantitative Microbiology 2(3), pp. 249-270, 2000.
30. T. Oppenlnder, "Potentials and applications of excimer lamps (incoherent vacuum-uv/uv sources) in photochemistry and in photochmical technology," tech. rep., University of Applied Sciences Furtwangen, 2001.
31. N. J. Rowan, S. J. MacGregor, J. G. Anderson, R. A. Fouracre, L. McIlvaney, and O. Farish, "Pulsed-light inactivation of food-related microorganisms," Appl. Environ. Microbiol. 65(3), pp. 1312-1315, 1999.