메뉴 건너뛰기




Volumn 9, Issue 9, 2006, Pages

High aspect ratio nickel structures fabricated by electrochemical replication of hydrofluoric acid etched silicon

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ELECTROCHEMISTRY; ETCHING; HYDROFLUORIC ACID; MICROMETERS; SILICON; SOLUTIONS;

EID: 33746473019     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2211867     Document Type: Article
Times cited : (11)

References (22)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.