Regular Arrays of Copper Wires Formed by Template-Assisted Electrodeposition

Advanced Materials

Volumn 16, Issue 5, 2004, Pages 409-413

  Zhang, Mingzhe ^a,b   Lenhert, Steven ^b,d   Wang, Mu ^a,c   Chi, Lifeng ^b,d   Lu, Nan ^b,d   Fuchs, Harald ^b,d   Ming, Naiben ^a  

^a NANJING UNIVERSITY   (China)

^b UNIVERSITY OF MÜNSTER   (Germany)

^c INSTITUTE OF PHYSICS   (China)

^d Center for Nanotechnology CeNTech   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTALLINE MATERIALS; ELECTROLYTES; ELECTROPLATING; LANGMUIR BLODGETT FILMS; MICROELECTROMECHANICAL DEVICES; NANOSTRUCTURED MATERIALS; NUCLEATION; PH EFFECTS; THIN FILMS; ULTRASONICS; WIRE;

REGULAR ARRAYS; SURFACE PRESSURE;

COPPER;

EID: 1842483553     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200305577     Document Type: Article

References (27)

1. a) M. Paunovic, M. Schlesinger, Fundamentals of Electrochemical Deposition, John Wiley & Sons, New York 1998.
2. b) Modern Electroplating, 4th ed., (Eds: M. Schlesinger, M. Paunovic), John Wiley & Sons, New York 2000.
3. Y. W. Su, C. H. Wu, C. C. Chen, C. D. Chen, Adv. Mater. 2003, 15, 49.
4. M. P. Zach, K. H. Ng, R. M. Penner, Science 2000, 290, 2120.
5. M. Wang, S. Zhong, X.-B. Yin, J.-M. Zho, R.-W. Peng, N.-B. Min, Phys. Rev. Lett. 2001, 86, 3827.
6. a) Y. Xia, G. M. Whitesides, Angew. Chem. 1998, 110, 568.
7. b) H. Sugimura, T. Hanji, K. Hayashi, O. Takai, Adv. Mater. 2002, 14, 524.
8. Electrochemical Technology: Innovation and New Developments (Eds: N. Masuka, T. Osako, Y. Ito), Gordon and Breach, Amsterdam 1996.
9. T. A. Taton, G. L. Lu, C. A. Mirkin, J. Am. Chem. Soc. 2001, 123, 5164.
10. J. A. Rogers, R. J. Jackmam, G. W. Whitesides, Adv. Mater. 1997, 9, 475.
11. R. J. Jackmam, S. T Brittain, A. Adams, M. G. Prentiss, G. W. Whitesides, Science 1998, 250, 2089.
12. S. Zhong, M. Wang, X.-B. Yin, J.-M. Zho, R.-W. Peng, N.-B. Min, J. Phys. Soc. Jpn. 2001, 70, 1452.
13. a) C. A. Foss, M. J. Tierney, C. R. Martin, J. Phys. Chem. 1992, 96, 9001.
14. b) S. A. Sapp, D. T. Mitchell, C. R. Martin, Chem. Mater. 1999, 11, 1183.
15. c) C. R. Martin, Science 1994, 266, 1961.
16. Y. C. Stephen, K. Chris, G. Jian, Nature 2002, 417, 853.
17. K. Spratte, L. F. Chi, H. Riegler, Europhys. Lett. 1994, 25, 211.
18. M. Gleiche, L. F. Chi, H. Fuchs, Nature 2000, 403, 173.
19. M. Gleiche, L. F. Chi, E. Gedig, H. Fuchs, ChemPhysChem 2001, 3, 187.
20. N. Lu, M. Gleiche, J. Zheng, S. Lenhert, B. Xu, L. F. Chi, H. Fuchs, Adv. Mater. 2002, 14, 1812.
21. C. Leger, L. Servant, J. L. Bruneel, F. Argoul, Physica A 1999, 263, 305.
22. V. Fleury, J. N. Chazalviel, M. Rosso, Phys. Rev. Lett. 1992, 68, 2492.
23. F. Sagues, M. Q. Lopez-Salvans, J. Claret, Phys. Rep. 2000, 337, 97.
24. M.-Z. Zhang, Y. Wang, S. Wang, G.-W. Yu, M. Wang, R.-W. Peng N.-B. Ming, J. Phys.: Condens. Matter 2004, 16, 695.
25. V. V. Tsukruk, V. N. Bliznyuk, Langmuir 1998, 14, 446.
26. P. Amirfeiz, S. Bengtsson, M. Bergh, E. Zangheilini, L. Börjessond, J. Electrochem. Soc. 2000, 147, 2693.
27. I. V. Markov, Crystal Growth for Beginners: Fundamentals of Nucleation, Crystal Growth and Epitaxy, World Scientific, Singapore 1995.