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Volumn 147, Issue 4, 2000, Pages 1555-1559
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In situ infrared observation of etching and oxidation processes on Si surfaces in NH4F solution
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Author keywords
[No Author keywords available]
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Indexed keywords
ABSORPTION SPECTROSCOPY;
AMMONIUM COMPOUNDS;
ETCHING;
INFRARED SPECTROSCOPY;
OXIDATION;
PH EFFECTS;
SURFACE CHEMISTRY;
AMMONIUM FLUORIDE;
MULTIPLE INTERNAL REFLECTION GEOMETRY;
OXIDE FORMATION;
OXIDE REMOVAL;
SILICON WAFERS;
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EID: 0033743479
PISSN: 00134651
EISSN: None
Source Type: Journal
DOI: 10.1149/1.1393393 Document Type: Article |
Times cited : (21)
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References (18)
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