Fabrication of high aspect ratio silicon microstructures by anodic etching

Journal of Micromechanics and Microengineering

Volumn 7, Issue 3, 1997, Pages 155-158

  Charlton, M D B ^a   Parker, G J ^a  

^a UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ENERGY GAP; ETCHING; POROUS SILICON;

ANODIC ETCHING;

MICROELECTROMECHANICAL DEVICES;

EID: 0031222637     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/7/3/020     Document Type: Article

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