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Volumn 3, Issue , 2006, Pages 1425-1428
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P-type conduction in a C-doped (1-101)GaN grown on a 7-degree-off oriented (001)Si substrate by selective MOVPE
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Author keywords
[No Author keywords available]
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Indexed keywords
HOLE CONCENTRATION;
INTENTIONAL CARBON DOPING;
ORGANIC VAPOR PHASE EPITAXY;
P-TYPE CONDUCTION;
73.61.EY;
81.15.GH;
CARBON DOPING;
CARBON SOURCE;
DOPING LEVELS;
METAL-ORGANIC VAPOUR PHASE EPITAXY;
SI SUBSTRATES;
CARBON;
CONCENTRATION (PROCESS);
DOPING (ADDITIVES);
ELECTRIC PROPERTIES;
METALLORGANIC VAPOR PHASE EPITAXY;
SUBSTRATES;
ORGANOMETALLICS;
SILICON;
SEMICONDUCTING GALLIUM COMPOUNDS;
GALLIUM NITRIDE;
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EID: 33746328364
PISSN: 18626351
EISSN: None
Source Type: Journal
DOI: 10.1002/pssc.200565305 Document Type: Conference Paper |
Times cited : (21)
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References (13)
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