Er3+ excited state absorption and the low fraction of nanocluster-excitable Er3+ in SiOx

Applied Physics Letters

Volumn 89, Issue 3, 2006, Pages

  Oton, C J ^a   Loh, W H ^a   Kenyon, A J ^b  

^a UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

^b UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC EXCITATION; IONS; LUMINESCENCE; NANOSTRUCTURED MATERIALS; SILICON;

ER EXCITED STATE ABSORPTION; LUMINESCENCE SENSITIZATION EFFECT; SILICON NANOCLUSTERS;

ERBIUM;

EID: 33746318628     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2227637     Document Type: Article

References (13)

1. M. Fujii, M. Yoshia, S. Hayashi, and K. Yamamoto, J. Appl. Phys. 84, 4525 (1998).
2. M. Wojdak, M. Klik, M. Forcales, O. B. Gusev, T. Gregorkiewicz, D. Pacifici, G. Franzo, F. Priolo, and F. Iacona, Phys. Rev. B 69, 233315 (2004).
3. J. H. Jie, J. H. Shin, K. J. Kim, and D. W. Moon, Appl. Phys. Lett. 82, 4489 (2003).
4. P. G. Kik and A. Polman, J. Appl. Phys. 88, 1992 (2000).
5. P. G. Kik and A. Polman, J. Appl. Phys. 91, 534 (2002).
6. F. Gourbilleau, M. Levalois, C. Dufour, J. Vicens, and R. Rizk, J. Appl. Phys. 95, 3717 (2004).
7. A. J. Kenyon, C. E. Chryssou, C. W. Pitt, T. Shimizu-Iwayama, D. E. Hole, N. Sharma, and C. J. Humphreys, J. Appl. Phys. 91, 367 (2002).
8. W. H. Loh and A. J. Kenyon, IEEE Photonics Technol. Lett. 18, 289 (2006).
9. M. V. Wolkin, J. Jorne, P. M. Fauchet, G. Allan, and C. Delerue, Phys. Rev. Lett. 82, 197 (1999).
10. N. Daldosso, M. Luppi, S. Ossicini, E. Degoli, R. Magri, G. Dalba, P. Fornasini, R. Grisenti, F. Rocca, L. Pavesi, S. Boninelli, F. Priolo, C. Spinella, and F. Iacona, Phys. Rev. B 68, 085327 (2003).
11. S. Seo and J. H. Shin, Appl. Phys. Lett. 75, 4070 (1999).
12. M. Fujii, M. Yoshida, Y. Kanzawa, S. Hayashi, and K. Yamamoto, Appl. Phys. Lett. 71, 1198 (1997).
13. J. Lee, J. H. Shin, and N. Park, J. Lightwave Technol. 23, 19 (2005).