Structural and optical properties of Si/SiO 2 superlattices prepared by low pressure chemical vapor deposition

Journal of Applied Physics

Volumn 100, Issue 1, 2006, Pages

  Yu, Zhenrui ^a   Aceves Mijares, Mariano ^a   Quiroga, Enrique ^a   Lopez Estopier, R ^a   Carrillo, Jesus ^b   Falcony, Ciro ^c  

^a INSTITUTO NACIONAL DE ASTROFÍSICA   (Mexico)

^b BENEMÉRITA UNIVERSIDAD AUTÓNOMA DE PUEBLA   (Mexico)

^c DEPARTAMENTO DE FÍSICA   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH TEMPERATURE ANNEALING; LOW PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD); REDSHIFT; SPECTRA;

ANNEALING; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; OPTICAL PROPERTIES; PHOTOLUMINESCENCE; SUPERLATTICES; TEMPERATURE DISTRIBUTION; THICKNESS CONTROL; X RAY DIFFRACTION ANALYSIS;

SILICA;

EID: 33746211162     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2210667     Document Type: Article

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