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Volumn 6154 III, Issue , 2006, Pages

Improvements in post-OPC data constraints for enhanced process corrections

Author keywords

[No Author keywords available]

Indexed keywords

EDGE PLACEMENT ERROR (EPE); OPC SOFTWARE; OPTICAL PROXIMITY CORRECTION (OPC); OPTICAL RULES CHECKING (ORC);

EID: 33745792768     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656649     Document Type: Conference Paper
Times cited : (3)

References (6)
  • 4
    • 0035043061 scopus 로고    scopus 로고
    • Mask manufacturing rule check: How to save money in your mask shop
    • 20th Annual BACUS Symposium
    • M. Keck, W. Ziegler, R. Liebe, T. Franke, G. Ballhorn, M. Kofferlein, J. Thiele, "Mask Manufacturing Rule Check: How to Save Money in Your Mask Shop", 20th Annual BACUS Symposium, Proc SPIE Vol 4186, p. 114-118, 2001
    • (2001) Proc SPIE , vol.4186 , pp. 114-118
    • Keck, M.1    Ziegler, W.2    Liebe, R.3    Franke, T.4    Ballhorn, G.5    Kofferlein, M.6    Thiele, J.7


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.