Generating mask inspection rules for advanced lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 1, 2005, Pages

  Badger, Karen ^a   Broadbent, Bill ^b   Dayal, Aditya ^b   Gallagher, Emily ^a   Hsiang, Chingyun ^b   Redding, Vincent ^b  

^a IBM   (United States)

^b KLA TENCOR CORPORATION   (United States)

Author keywords

Database; Duv inspection; Inspectability; MRC; OPC; Sensitivity; STARlight

Indexed keywords

DUV INSPECTION; INSPECTABILITY; MRC; OPC; STARLIGHT;

DATA HANDLING; DATABASE SYSTEMS; IMAGE ANALYSIS; INSPECTION; MASKS; SENSITIVITY ANALYSIS;

LITHOGRAPHY;

EID: 33644609887     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.632478     Document Type: Conference Paper

References (4)

1. Liebmann, L., "Resolution Enhancement Techniques in Optical Lithography, It's not just a Mask Problem", Proc. SPIE Vol. 4409, 2001, pp. 23-32.
2. Keck, M. et al., "Mask manufacturing rule check: how to save money in your mask shop", Proc. SPIE Vol. 4186, 2001, pp. 114-118.
3. Broadbent, W. et al., "Results from a new reticle defect inspection platform", Proc. SPIE Vol. 5256, 2003, pp. 474-488.
4. Dayal, A. et al., "Optimized Inspection of Advanced Reticles on the TeraScan Reticle Inspection Tool", Proc. SPIE (this conference).