Mask manufacturing rule check: How to save money in your mask shop

Proceedings of SPIE- The International Society for Optical Engineering

Volumn 4186, Issue , 2001, Pages 114-118

  Keck, M ^a   Ziegler, W ^a   Liebe, R ^a   Franke, T ^a   Ballhorn, G ^a   Ko�fferlein, M ^a   Thiele, J ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; COMPUTATIONAL COMPLEXITY; COMPUTER SOFTWARE; OPTICAL RESOLVING POWER; PHOTOLITHOGRAPHY;

MANUFACTURING RULE CHECK (MRC); OPTICAL PROXIMITY CORRECTION (OPC);

MASKS;

EID: 0035043061     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.410681     Document Type: Article

References (0)