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Proceedings of SPIE - The International Society for Optical Engineering
Volumn 5256, Issue 2, 2003, Pages 777-784
Detection and impact of mask manufacturing constraints on OPC efficacy
Author keywords

[No Author keywords available]
Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; CONSTRAINT THEORY; ETCHING; LITHOGRAPHY; LOW PASS FILTERS; OPTICAL RESOLVING POWER; PHASE TRANSITIONS;
EID: 1842474934     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.518275     Document Type: Conference Paper
Times cited : (2)
References (4)
  • 1
    • 0037628603 scopus 로고    scopus 로고
    • Enforcement of mask rule compliance in model-based OPC'ed layouts during data preparation
    • BACUS 2002
    • D. Meyer, R. Vuletic, A. Seidl, "Enforcement of mask rule compliance in model-based OPC'ed layouts during data preparation", BACUS 2002, Proc. SPIE Vol. 4889, p. 67-73.
    • Proc. SPIE , vol.4889 , pp. 67-73
    • Meyer, D.1    Vuletic, R.2    Seidl, A.3
  • 2
    • 0037627759 scopus 로고    scopus 로고
    • GDS-based mask data preparation flow: Data volume containment by hierarchical data processing
    • BACUS 2002
    • S. Schulze, P. LaCour, P. Buck, "GDS-based mask data preparation flow: data volume containment by hierarchical data processing", BACUS 2002, Proc. SPIE Vol. 4889, p. 104-114
    • Proc. SPIE , vol.4889 , pp. 104-114
    • Schulze, S.1    Lacour, P.2    Buck, P.3
  • 3
    • 0029492542 scopus 로고
    • Fast Sparse Aerial Image Calculation for OPC
    • BACUS 1994
    • N. Cobb, A. Zakhor, "Fast Sparse Aerial Image Calculation for OPC", BACUS 1994, Proc. SPIE Vol. 2621, p. 534-545, 1995.
    • (1995) Proc. SPIE , vol.2621 , pp. 534-545
    • Cobb, N.1    Zakhor, A.2
  • 4
    • 0141722435 scopus 로고    scopus 로고
    • The impact of mask topography and resist effects on optical proximity correction in advanced alternating phase shift process
    • Microlithography 2003
    • M. Cheng, B. Ho, D. Guenther, "The impact of mask topography and resist effects on optical proximity correction in advanced alternating phase shift process", Microlithography 2003, Proc. SPIE Vol. 5040, p. 313-326
    • Proc. SPIE , vol.5040 , pp. 313-326
    • Cheng, M.1    Ho, B.2    Guenther, D.3

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.