Enforcement of mask rule compliance in model-based OPC'ed layouts during data preparation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 1, 2002, Pages 67-73

  Meyer, Dirk ^a   Vuletic, Radovan ^a   Seidl, Alexander ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

Design for manufacturability; Mask rule check; Mixed integer programming; Model based OPC

Indexed keywords

DATA PROCESSING; DYNAMIC RANDOM ACCESS STORAGE; INTEGER PROGRAMMING;

MASK RULE CHECKS (MRC);

MASKS;

EID: 0037628603     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.467751     Document Type: Conference Paper

References (4)

1. th Annual BACUS Symposium on Photomask Technology, Proc. of the SPIE Vol. 4186, pp 114-118, 2001
2. A. Wong, Resolution enhancement techniques in optical lithography, Ch. 4, SPIE - The International Society for Optical Engineering, Bellingham, Washington, 2001
3. th Annual BACUS Symposium on Photomask Technology, Proc. of the SPIE Vol. 4186, pp 119-128, 2001
4. G. Kedem, H. Watanabe, "Graph-Optimization Techniques for IC Layout and Compaction", IEEE Transactions on Computer-Aided Design, Vol. CAD-3, No.1, pp 12-20, 1984