Assessment of 5-pole illumination for 65nm-node contact holes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 3, 2005, Pages 1405-1416

  Weisbuch, Francois ^a   Warrick, Scott ^b   Conley, Will ^c   Depre, Jérôme ^d  

^a STMICROELECTRONICS   (France)

^b Freescale Semiconducteurs France SAS   (France)

^c FREESCALE SEMICONDUCTOR INC   (United States)

^d ASML   (Netherlands)

Author keywords

Aerial image; Contact; Illumination; Multiple exposure; Process windows; RET; Simulation; Windmill

Indexed keywords

AERIAL IMAGE; MULTIPLE EXPOSURE; PROCESS WINDOWS; RET; WINDMILLS;

DIFFRACTION; IMAGING TECHNIQUES; LENSES; PRINTING; PROCESS ENGINEERING; SIMULATION;

LIGHTING;

CONTACTING; DIFFRACTION; ILLUMINATION; LENSES; PRINTING;

EID: 25144439900     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599760     Document Type: Conference Paper

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