193-nm Immersion photomask image placement in exposure tools

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 I, Issue , 2006, Pages

  Cotte, Eric ^a   Alles, Benjamin ^b   Wandel, Timo ^a   Antesberger, Gunter ^a   Teuber, Silvio ^a   Vorwerk, Manuel ^c   Frangen, Andreas ^c   Katzwinkel, Frank ^c  

^a Advanced Mask Technology Center   (Germany)

^b TECHNICAL UNIVERSITY OF MUNICH   (Germany)

^c INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

Charging; Mask chucking; Optical mask; Overlay; Registration; Wafer exposure

Indexed keywords

COMPUTER SIMULATION; FINITE ELEMENT METHOD; IMAGE ANALYSIS; LITHOGRAPHY; OPTICS; THERMAL EFFECTS;

CHARGING; MASK CHUCKING; OPTICAL MASK; OVERLAY; REGISTRATION; WAFER EXPOSURE;

MASKS;

EID: 33745779878     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656373     Document Type: Conference Paper

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