Effects of material properties on patterning distortions of optical reticles

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3546, Issue , 1998, Pages 214-220

  Shamoun, Bassam ^a   Trybula, Walter ^a   Engelstad, Roxann L ^a   Lovell, Edward G ^a  

^a Etec Systems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; FINITE ELEMENT METHOD; FLUORSPAR; PHOTORESISTS; SILICA; THERMAL CONDUCTIVITY OF SOLIDS; THERMAL EXPANSION;

OPTICAL RETICLES; PHOTOMASKS;

MASKS;

EID: 0032300946     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.332829     Document Type: Conference Paper

References (5)