Mask-related distortions of modified fused silica reticles for 157-nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4562 II, Issue , 2001, Pages 914-925

  Mikkelson, Andrew R ^a   Abdo, Amr Y ^a   Cotte, Eric P ^a   Sohn, Jaewoong ^a   Engelstad, Roxann L ^a   Lovell, Edward G ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

157 nm lithography; Film stress; Finite element analysis; In plane distortions; Out of plane distortions; Pellicle; Photomask

Indexed keywords

COMPUTER SIMULATION; ELECTRON BEAMS; ERROR ANALYSIS; FINITE ELEMENT METHOD; FUSED SILICA; IMAGE ANALYSIS; OPTICAL DESIGN; OPTICAL FIBER FABRICATION; OPTICAL FILMS; PHOTOLITHOGRAPHY; SCANNING; THERMOANALYSIS;

PHOTOMASKS;

MASKS;

EID: 0035763625     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.458256     Document Type: Conference Paper

References (4)

1. Brooks, C., IBM (personal communications).
2. Cotte, E., Lovell, E., and Engelstad, R., "Equivalent Modeling Techniques for Predicting Pattern Transfer in EPL Masks," Microelectronic Engineering, Vol. 58-59, pp. 461-466, 2000.
3. Cotte, E., Engelstad, R., Lovell, E., Shkel, Y., Eschbach, F., Shu, E., Tanzil, D., and Calhoun, R., "Distortions in Advanced Photomasks from Soft Pellicles," to appear in Microelectronic Engineering, 2001.
4. nd International Symposium on 157 nm Lithography, International SEMATECH, 2001.