Hot spot management in ultra-low k1 lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6156, Issue , 2006, Pages

  Hashimoto, Kohji ^a   Usui, Satoshi ^a   Nojima, Shigeki ^a   Tanaka, Satoshi ^a   Yamanaka, Eiji ^a   Inoue, Soichi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Hot spot extraction; Hot spot management; Hot spot monitoring; Hot spot reduction; Lithography; Ultra low k1

Indexed keywords

COSTS; LSI CIRCUITS; MASKS; SEMICONDUCTOR DEVICE MANUFACTURE;

HOT SPOT EXTRACTION; HOT SPOT MANAGEMENT; HOT SPOT MONITORING; HOT SPOT REDUCTION; ULTRA-LOW K1;

PHOTOLITHOGRAPHY;

EID: 33745769262     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656418     Document Type: Conference Paper

References (7)

1. nd Annual BACUS Symposium on Photomask Technology, Vol.4889, pp.187-196, 2002
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3. S.Inoue, T.Kotani, S.Nojima, S.Tanaka, K.Hashimoto and I.Mori, "Design for Manufacturability and Impact on OPC/Mask/Litho. Technologies", Digest of Papers Photomask Japan 2004 (Symposium on Photomask and Next-generation Lithography Mask Technology XI), pp.185-186, 2004
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6. th Annual BACUS Symposium on Photomask Technology, Vol.5992, 2005
7. T.Mitsui and Y.Yamazaki, "Automated Semiconductor Circuit Pattern Evaluation", Technical Summary Digest of Microlithography (SPIE 31st International Symposium), 6152-158, pp.95, 2006