Efficient Hybrid Optical Proximity Correction Method Based on the Flow of Design for Manufacturability (DfM)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5130, Issue , 2003, Pages 628-637

  Kotani, Toshiya ^a   Ichikawa, Hirotaka ^b   Urakami, Takanori ^b   Nojima, Shigeki ^a   Kobayashi, Sachiko ^b   Oikawa, Yoko ^a   Tanaka, Satoshi ^a   Ikeuchi, Atsuhiko ^b   Suzuki, Kiminobu ^a   Inoue, Soichi ^a  

^a TOSHIBA CORPORATION   (Japan)

^b Toshiba Microelectronics Company   (Japan)

Author keywords

Design rule checker (DRC); Lead time; Library based OPC; Low k1 lithography; Manufacturability check (MC); Optical proximity correction (OPC); Pattern integrity

Indexed keywords

CRITICAL DIMENSIONS (CD); DESIGN RULE CHECKER (DRC); LEAD TIME; LIBRARY-BASED OPC; LOW-KL LITHOGRAPHY; MANUFACTURIBILITY CHECK (MC); OPTICAL PROXIMITY CORRECTION (OPC); PATTERN INTEGRITY; RESOLUTION ENHANCEMENT TECHNIQUE (RET);

COMPUTER SIMULATION; MASKS; PHOTOLITHOGRAPHY; PROXIMITY SENSORS; TOPOLOGY; ULSI CIRCUITS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 1642514742     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.504271     Document Type: Conference Paper

References (3)

1. S, Inoue, T. Kotani, S. Nojima, S. Tanaka, K. Hashimoto and I. Mori: Electronic Design Processes (EDP) Workshop (2003).
2. T. Kotani, S. Kobayashi, H. Ichikawa, S. Tanaka, S. Watanabe and S. Inoue: Proc. SPIE Vol.4691 (2002) 188.
3. S. Kobayashi, T. Uno, K. Yamamoto, S. Tanaka, T. Kotani, S. Inoue, H. Higurashi, S. Watanabe, M. Yano, S. Ohki and K. Tsunakawa: Proc. SPIE Vol.3679 (1999) 614.