Fabrication of ZnO nanostructure using near-field optical technology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3791, Issue , 1999, Pages 132-139

  Lee, G H ^a   Yamamoto, Y ^a   Kourogi, M ^a   Ohtsu, M ^a  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; IRRADIATION; LIGHT SOURCES; NANOSTRUCTURED MATERIALS; OPTICAL INSTRUMENTS; STRUCTURE (COMPOSITION); SUBSTRATES; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

CRYSTALLINITY; NANODOTS; NEAR FIELD OPTICAL TECHNOLOGY; PHOTOENHANCED CHEMICAL VAPOR DEPOSITION; PLANAR FILMS;

OPTICAL SYSTEMS;

EID: 0033327560     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (17)