Supercritical CO 2 for high resolution photoresist development

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 II, Issue , 2006, Pages

  Felix, Nelson ^a   Tsuchiya, Kousuke ^b   Luk, Camille Man Yin ^a   Ober, Christopher K ^a  

^a Cornell University   (United States)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

E beam lithography; Molecular glass resists; Supercritical CO 2 EUV resists

Indexed keywords

MOLECULAR GLASS RESISTS; SEMICONDUCTOR INDUSTRY; SUPERCRITICAL CO 2 EUV RESISTS;

CARBON DIOXIDE; ELECTRON BEAM LITHOGRAPHY; GLASS; PHOTORESISTS; SOLUBILITY; TOXIC MATERIALS;

SUPERCRITICAL FLUIDS;

EID: 33745635075     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656523     Document Type: Conference Paper

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